Polyimide Gasket

This product is specifically designed for electrical isolation and sealing in the process chamber of semiconductor dry etching equipment.

Its main functions include

• Maintaining electrical uniformity and stability inside the process chamber
• Preventing electrical anomalies or process defects caused by ion/plasma interference
• Providing airtight sealing to prevent gas leakage
• Withstanding high temperature and corrosive process gases to ensure long-term stable operation

Applicable For

• Dry etching equipment
• Critical etching steps in semiconductor wafer processes
• Maintaining high-precision lithography/etch pattern fidelity

Key Features & Advantages

• High insulation performance – helps prevent process abnormalities caused by plasma discharge or electrical leakage
• Excellent heat resistance – suitable for high-temperature etching environments
• Chemical corrosion resistance – compatible with common etch gases such as CF₄, SF₆, and Cl₂
• Excellent airtightness – effectively seals process gases inside the chamber and reduces leakage risk
• Customizable size and shape – can be designed according to tool configuration and application requirements